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Atomic Layer Deposition (A 1-page experiment)
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Interactive model, with minimal support
Go To Activity |
 | Overview and Learning ObjectivesWhat affects the making of an atomic-scale film such as that used in the printing of circuitry? In this activity, students undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film. Students will be able to:
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 | Classroom PracticeYou might link the model to an animation of ALD as used in manufacturing: http://www.cambridgenanotech.com/animation/ |
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 | Central ConceptsKey Concept: Molecules can be layered on top of precursors to build up the thickness of a film useful in atomic-scale manufacturing. Additional Related Concepts |
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 | Macro Micro LinkThis nanoscale technique is useful in the printing of circuitry. |
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 | Activity Creditsusing Molecular Workbench |
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